Used AMAT / APPLIED MATERIALS Endura II #293617297 for sale

AMAT / APPLIED MATERIALS Endura II
ID: 293617297
Wafer Size: 12"
Vintage: 2021
System, 12" Process: Metal 2021 vintage.
AMAT / APPLIED MATERIALS Endura II is a chemical vapor deposition (CVD) reactor used in the fabrication of semiconductor materials. It is a high-performance equipment built for unsurpassed process control and power. AMAT Endura II is capable of a wide range of process parameters, including pressure, temperature, and reactant flow. It also includes a variety of diagnostic measurements, such as optical emission spectroscopy, mass spectrometry and surface wafer characterization. APPLIED MATERIALS Endura II incorporates a high-temperature filtration system to maximize gas purity, providing excellent process repeatability and yields. Its large reaction chamber can accommodate large wafers, up to 12" in diameter. The reactor also features an automatic sample transfer (AST) module and an integrated load-lock to minimize contamination and maximize throughput. Endura II also features an inert chamber surrounding the reaction chamber. This feature allows for a high-pressure overpressure to be maintained, allowing for improved arc motion and wafer heating control. The inert chamber also ensures a clean environment for the reaction chamber, enabling better process control. AMAT / APPLIED MATERIALS Endura II is equipped with a powerful computer-controlled process control unit. This allows the user to customize the chamber environment and alter parameters to the necessary level for each process. Additionally, the machine includes a Process Diagnostics Module that provides real-time data to the user, allowing for process optimization. AMAT Endura II also includes a remote diagnostics and support platform. This allows AMAT to receive and analyze process and tool data. The platform also provides guidance and recommendations for troubleshooting and maintenance. Overall, APPLIED MATERIALS Endura II is a powerful, high-performance CVD reactor that is ideal for low-temperature processing of a wide variety of semiconductor materials. It is a reliable, user-friendly and clean asset that ensures outstanding process yields, excellent process repeatability and speedy throughput.
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