Used AMAT / APPLIED MATERIALS Endura II #293669572 for sale

ID: 293669572
Systems Rack.
AMAT / APPLIED MATERIALS Endura II is a versatile and efficient chemical vapor deposition (CVD) reactor designed for the fabrication of high-quality thin films. AMAT Endura II enables the fabrication of films with a wide range of physical and chemical properties on low-cost compact wafers and substrates as well as high-volume production substrates. APPLIED MATERIALS Endura II reactor utilizes a variety of tools for precision process control and process tailoring. These include variable pulsing frequencies, variable pulse amplitudes, and adjustable time constants for accurate process control. Its long quartz reaction bellows allow for a large range of process gases to be used for a variety of process parameters. Endura II also features a choice of manual or computer-controlled operations, allowing the user to select the most suitable for their requirements. AMAT / APPLIED MATERIALS Endura II reactor incorporates a high-capacity, high-performance heating system. The low-level thermal radiation suppression system and adjustable reaction temperature profile minimize process variation and ensures precise repeatable performance. A high-power direct current (DC) pulse generator provides additional flexibility for a wide variety of process conditions and experimental treatments. AMAT Endura II also allows for the accomplishment of efficient, economical, and accurate thin-film processing. It enables up to 8-inch wafers and has a low power consumption with a compact design. This reduced size allows for more efficient use of process space and reduces the amount of maintenance required. APPLIED MATERIALS Endura II reactor is equipped with AMAT patented High-Capacity Purge mechanism for purging inert gases. This feature eliminates the need for a separate purge gas line and protects process sensitive materials from potential contamination by outside gases. Endura II is an indispensable tool for the successful fabrication of high-quality thin films for a wide range of industries. Its efficiency, precision, and versatility make it an ideal choice for a variety of CVD applications.
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