Used AMAT / APPLIED MATERIALS Endura II #293758429 for sale

AMAT / APPLIED MATERIALS Endura II
ID: 293758429
PVD System Process: PC-XT DS-TiN ALPS (2) SIP-Ti (2) DS-AL .
AMAT / APPLIED MATERIALS / AKT Endura II is a high-performance processing reactor used in research, development, and production of various materials in micro- and nano-electronics applications. This reactor utilizes advanced features to ensure precision thermal and chemical processes. It has a wide temperature range which allows flexibility when performing any type of operation. The reactor comes equipped with a susceptor equipment designed to evenly distribute heat throughout the system. This not only reduces temperature along the sidewalls and corners, but also minimizes thermal gradients, which can cause the cracks in material layers. Another great feature is the vibrant exhaust unit, which quickly pumps air out of the reactor chamber to allow for quicker processing time. AKT Endura II has precise control over process variables, including backing pressure, composition, and temperature. This allows users to easily calibrate the process conditions to a level within the desired tolerance. Furthermore, the design reduces the possibility of contamination from the environment. The reactor comes installed with two quartz windows on the side of the chamber to allow users to monitor the process in real time, providing great versatility. In addition, AMAT Endura II features a selectable seed layer which increases the uniformity of the deposited material. This is especially advantageous for thin layer deposition, which can be challenging when operating with conventional systems. The double lid design reduces the risk of ashing the wafer due to outgassing during the process. Ultimately, Endura II is a highly versatile, advanced reactor machine ideal for various research and production applications. Its wide temperature range, precise process control, uniform seed layer, and vibrant exhaust tool provide users with great flexibility and reliability. As such, it is an excellent choice for the latest research projects and production tasks.
There are no reviews yet