Used AMAT / APPLIED MATERIALS Endura II #293814085 for sale

AMAT / APPLIED MATERIALS Endura II
ID: 293814085
Vintage: 2018
Physical Vapor Deposition (Pvd) System, 12" (4) Aluminum Nitride (AlN) Physical Vapor Deposition (PVD) process chambers (1) Degas chamber (1) Pre-clean chamber 2018 vintage.
AKT/AMAT / APPLIED MATERIALS / AKT Endura II Reactor is a state-of-the-art equipment for process integration and production of semiconductor devices. The system provides the capability to integrate deposition, etch, and metrology operations in a highly compact, efficient reactor platform. The unit features a unique envelope geometry which utilizes a single or dual wafer loading platform to enable simultaneous loading of two 100mm or 125mm wafers for processing. This allows for significantly reduced cycle times, improved productivity, and increased yield from a smaller footprint than traditional systems. AKT Endura II reactor is equipped with an advanced 1x wafer loader, along with multiple wafer storage slots for both process wafers as well as baymented metals. The machine is designed for IC fabrication processes, such as sputtering, ion implanting, etch, and deposition. It also features a new loading tool that allows for quick and efficient loading of both 100mm and 125mm wafers, as well as a new chamber design that prioritizes process uniformity and repeatability. AMAT Endura II is powered by AMAT Precision Motorized Batch (PMB) technology, providing excellent process repeatability and tight process control. It also features a comprehensive suite of process control software including a semi-automated wafer alignment asset, vacuum control, and multiple process recipes. The model also has multiple options for hardware upgrade and custom tooling, allowing for even greater process flexibility. APPLIED MATERIALS Endura II is the ideal solution for high-throughput and high-volume semiconductor device production. It features a wide range of process recipes and an easy to use graphical user interface, enabling process engineers to quickly and efficiently develop recipes for various IC fabrication requirements. The reactor is also designed to be easily integrated into both traditional cleanroom facilities and advanced fab production lines, allowing for seamless integration into existing manufacturing environments.
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