Used AMAT / APPLIED MATERIALS Endura II #293815284 for sale
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ID: 293815284
Vintage: 2017
Physical Vapor Deposition (PVD) system
XU-ACP130-A15 Prealigner & centering module
XU-RC350S Automated Teller Machine (ATM) robot
NXC100 Controller
XU-ACL4230 Linear track module
(3) Front Opening Unified Pod (FOUP) load ports
Gray platform type
Chamber Positions:
Chamber 1: VERSA TiN
Chamber 2: HT AL
Chamber 3: HT AL
Chamber 4: VERSA TiN
Chamber 5: HT AL
Chamber 6: HT AL
Chamber 7: VERSA TiN
Chamber 8: DMD
Chamber F: DMD
MF Robot: XP
NSK Robot controller, ceramic blade
CF Config: Dual Pass
Standard loadlock type
Gray loadcenter type:
0190‑48620 DI Cooler
Cryo compressor, 208V
Line frequency: 50-60 Hz
Line voltage: 208V / 480V
UPS
2017 vintage.
AMAT / APPLIED MATERIALS / AKT Endura II is a revolutionary, laboratory scale, chemical vapor deposition (CVD) -type reactor designed specifically for semiconductor LCD research, development, and production applications. AKT Endura II is a capacitively-coupled plasma (CCP) reactor configured for low-temperature ionized deposition. It has a large plasma processing chamber and utilizes a radio antenna for plasma excitation. It is an open-architecture system that uses industry-standard components and materials. The theoretical throughput is nearly 3x that of most conventional systems, and it is able to handle large substrates without compromising throughput or feature uniformity. It also provides excellent process repeatability, ensuring the highest levels of accuracy and uniformity of product integration. AMAT Endura II produces a larger than average chamber with added uniformity compared to other CVD systems. This ensures that all substrates receive the same dosage of plasma excitation. The antenna size and type also help generate better quality products. In addition, the dual plasma setting allows two different sets of process parameters to be run simultaneously, allowing for optimized process control. The heating options provided by APPLIED MATERIALS Endura II are also highly configurable. The ability to change between gas heating and direct heating systems provides flexibility for individual process goals, while also reducing downtime associated with changing out gases. This also ensures uniform temperatures throughout the plasma chamber, which increases product consistency. Endura II is designed to be easy to use and maintain, with built-in diagnostic tools and comprehensive technical support. Remote monitoring capabilities allow technicians to quickly identify any potential issues with the system, helping to keep it running at maximum efficiency. AMAT / APPLIED MATERIALS / AKT Endura II has revolutionized the process of CVD research and development by providing a powerful, yet simple-to-use system that is reliable and loaded with features designed to meet the most demanding application requirements. It is ideal for research, development, and production applications in the LCD, OLED, and other semiconductor-related fields.
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