Used AMAT / APPLIED MATERIALS Endura II #293830799 for sale

ID: 293830799
Vintage: 2015
Physical Vapor Deposition (PVD) system (4) PVD Chambers (2) Process chambers, 12", PN: 0060-03608, 0060-03609 Degas chamber Pre clean chamber Carrier, 12" Wafer, 4" - 6" Load port Wafer carrier, 5 x 4" Wafer pocket, 4" Tray (2) SiC Carrier (4", 6 hole) SiC Carriers HON HAI PRECISION, Endura 2, 4" - 6P + 2" -1P SiC Tray EDWARDS, IH600, Dry pump (IH600 MKS), Power supply: 200 - 208 V EDWARDS, IH600 MK5, Pump, Power supply: 200 - 208 VG, 50/60 Hz 2015 vintage.
AMAT / APPLIED MATERIALS / AKT Endura II reactor is a high-performance, cost-effective plasma-enhanced chemical vapor deposition equipment designed to deposit an extensive range of coating materials. With the ability to deposit films with exceptional uniformity, adhesion and verticality, AKT Endura II reactor is ideal for a variety of applications including advanced substrates, optoelectronics, MEMS, flat panel displays and biocompatible coatings. At the heart of the system design is AKT` patent pending Smart View plasma chamber. This feature allows for easy monitoring of the deposition process from the rear of the plasma chamber. With the chamber window in place, researchers benefit from an increase in deposition uniformity by allowing monitoring of the entire chamber in real time. The Smart View feature also assists researchers in understanding the effects of process parameters to the deposition rate in challenging applications. AMAT Endura II reactor is constructed with a dual-zone resistively-heated thermal unit which helps ensure homogeneous sample or substrate coating. Its two-zone temperature control machine helps to ensure uniform temperature distribution across the working area, while also providing a fast, clean start-up and cool-down. The reactor is equipped with reactive detectors that monitor the gas distribution within the chamber and provide detailed process information. Additionally, with Adjustable RF Generator (ARG) and Linear Sweep RF Generator (LSG) functionalities, APPLIED MATERIALS Endura II plasma reactor offers researchers additional advantages over traditional CVD systems. In addition to its Smart View plasma chamber, Endura II reactor is designed for maximum plasma control. Its fixed frequency and adjustable frequencies give researchers the ability to reduce particle depletion and increase plasma uniformity. AMAT / APPLIED MATERIALS / AKT Endura II is also equipped with high-precision automated gas shut-off and gas control tool that monitors the mixture of gases to ensure optimal processing. In terms of safety, AKT Endura II reactor is equipped with a vacuum interlock asset, a corrosion-resistant stainless steel chamber, and designed with a low level of emissions. It is equipped with an advanced emergency monitoring model that prevents any misuses and provides a safe and secure working area. To summarize, AMAT Endura II is a high-performance, cost-effective plasma-enhanced chemical vapor deposition equipment designed to deposit an extensive range of coating materials. With its unique Smart View plasma chamber, two-zone temperature control system, reactive detectors, adjustable and linear sweep RF generatros, gas shut-off and gas control unit, and advanced emergency monitoring machine, APPLIED MATERIALS Endura II reactor offers an remarkable solution for a variety of coating applications.
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