Used AMAT / APPLIED MATERIALS Endura II #9167151 for sale

AMAT / APPLIED MATERIALS / AKT Endura II facilitates plasma-enhanced chemical vapor deposition (PECVD). The reactor is specifically used in the fabrication of semiconductor chips for use in personal electronic devices, as well as other thin-film technologies with a focus on energy efficiency. The device has a dual-induction coil with a Hextron plasma source to ensure a high deposition rate of up to 5 nanometers/minute. It features a large chamber with a high-quality hot-wall, which provides an optimal temperature environment for the vaporized reactants. The two process chambers offer a low-pressure, low-temperature CVD environment. AKT Endura II features a low-maintenance reactor with microwave-powered controllers and lower power consumption than other models. The controller monitors and maintains optimal performance conditions for different rates of production. The reactor also offers uniformity and repeatability in production conditions over time. The active surface modification and plasma dispersion equipment ensures uniform and homogenous surface coating, and the horizontal detector ensures uniform coverage on a highly reflective surface. AMAT Endura II reactor is designed with safety considerations in mind, and features an integrated safety system that limits the amount of toxic gases within the chamber. In addition, the reactor features a ceramic-sealed vacuum chamber with an electrical pressurization unit that prevents the release of reactive gases into the environment. Furthermore, a network of gas, vacuum, pressure, and water systems allows for increased safety in the production environment. Endura II is designed to meet different application needs, featuring temperature-based optimization and in-situ monitoring, and enhanced control of substrate uniformity and consistency. The device is simple to install and operate, and is ideal for a variety of technologies ranging from specialized to more generalized production processes. Its advanced control machine allows for the automated tuning of process parameters, reducing the need for operator intervention for repeatable production. Overall, APPLIED MATERIALS Endura II is a highly efficient, cost-effective, reliable and safe plasma-enhanced chemical vapor deposition reactor. It provides an optimal environment for fabrication of small-scale devices from a variety of thin-film technologies while ensuring a high deposition rate and uniformity of production conditions.