Used AMAT / APPLIED MATERIALS Endura II #9188225 for sale

AKT/AMAT / APPLIED MATERIALS / AKT Endura II Reactor is a semiconductor fabrication tool used in the production of solar cells, LEDs, optics, and MEMS. It is a low temperature chemical vapor deposition (LTCVD) reactor that uses both resistive heating and rapid thermal processing (RTP) technologies. AKT Endura II is part of AMAT suite of PECVD (Plasma Enhanced CVD) processing systems and is designed for production of highly uniform thin films with good adhesion and excellent layer-to-layer step coverage. AMAT Endura II reactor is equipped with an RTP chamber that can quickly raise the temperature of the substrate wafer up to 850°C in just a few seconds. This chamber uses radiation from an array of high-intensity lamps to quickly heat the wafer. This enables Endura II to create high-quality films in a much shorter amount of time than traditional PECVD systems. APPLIED MATERIALS Endura II is also capable of depositing oxide and nitride films down to a thickness of only several nanometers. Additionally, AMAT / APPLIED MATERIALS / AKT Endura II uses a low pressure, chlorine-containing, remote plasma source to ensure consistent film deposition across the entire wafer. This plasma source is separated from the main reaction chamber so that the chlorine can be added directly to the film without depositing atoms directly onto the substrate. This helps to maintain excellent step coverage, even on complex three-dimensional structures. AKT Endura II is a highly versatile system capable of depositing a variety of dielectric films to meet specific requirements for different applications. It is also capable of pre-cleaning the substrate wafer, something that is often critical for the successful processing of specialist applications. Overall, AMAT Endura II is an incredibly capable LTCVD reactor that is well-equipped to deposit the highest quality films for a variety of different applications. Its rapid thermal processing capabilities make it ideal for production environments, and its capability for pre-cleaning wafers make it suitable for more complex specialist applications.