Used AMAT / APPLIED MATERIALS Endura II #9188227 for sale

AMAT / APPLIED MATERIALS Endura II
ID: 9188227
Wafer Size: 12"
Vintage: 2009
PVD Chamber, 12" 2009 vintage.
AKT/AMAT / APPLIED MATERIALS / AKT Endura II is an advanced batch reactor equipment that is used to form and deposit thin layers of various materials onto different substrates. This system houses a specialized vacuum chamber that contains a series of high-slope, precisely adjustable, crucibles, which can carry targets made of a variety of materials. These crucibles are connected to a series of robotic deposition arms, which can globally or locally manage the delivery of the materials in the crucible onto the substrate. AKT Endura II is designed for a wide range of materials and substrates, and its ability to rapidly heat materials and accurately control their temperature allows for a wide range of recipes to be grown, deposited, and etched. It also features a patented two-chamber processing unit that can provide either a pre-sputter or pre-cleaning stage for more intensive processing applications. AMAT Endura II uses a high-frequency radio frequency inductive plasma source for high-quality, precise etching and deposition of materials at low temperatures. It also features a hydrogen gas feed that allows for excellent annealing results at lower temperatures. The machine also includes a helium gas feed that allows for improved wet etching control while preserving the aspect ratio of the etched pattern. APPLIED MATERIALS Endura II uses a patented uniform sputtering technique that provides exceptionally uniform deposition of materials across large substrates. This technique uses multiple-duty cycle power to provide more consistent deposition layer-to-layer. It also includes a vacuum baking tool that reduces contaminants and eliminates dust particles to ensure a clean environment. Endura II is an advanced batch reactor asset that combines the latest technologies to enable efficient growth, deposition, and etching of various semiconductor materials. It is a reliable and cost-effective solution for companies making semiconductor devices with layers of precision and quality. It is ideal for those in the semiconductor materials industry as it provides a reliable deposition process for advanced materials.
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