Used AMAT / APPLIED MATERIALS Endura II #9235107 for sale

AMAT / APPLIED MATERIALS Endura II
ID: 9235107
Wafer Size: 12"
Vintage: 2012
System, 12" Process: Metal 2012 vintage.
AMAT / APPLIED MATERIALS / AKT Endura II reactor is a plasma enhanced chemical vapor deposition (PECVD) equipment used in semiconductor applications such as thin film deposition. AKT Endura II is part of a larger family of PECVD reactors, each of which has been designed to provide exceptional performance. AMAT Endura II has a dual-frequency RF system, an advanced computer control unit, and a robust chamber design. APPLIED MATERIALS Endura II has the ability to alternative between 27 MHz and 13.56 MHz. This dual frequency capability helps to increase the number of available gas species that can be utilized for the deposition. In addition, Endura II's RF machine has an adjustable operating mode, which allows users to program different conditions for both frequency and power delivery. This helps to enable more precise control of the deposition process. The RF tool also has a higher power capacity, allowing it to run faster processes with higher deposition rates. AMAT / APPLIED MATERIALS / AKT Endura II also features an advanced computer control asset with the ability to control multiple tools at the same time. This makes it easier to synchronize multiple tools while executing complex deposition recipes. The model also has an intuitive user interface, which helps to streamline the processes and makes the equipment more user-friendly. AKT Endura II also features a robust chamber design. This helps to extend the lifetime of the chamber and reduce maintenance costs related to cleaning or replacing parts. It also provides optimal deposition uniformity and repeatability, ensuring the highest levels of quality in each run. AMAT Endura II is NFPA-compliant, meeting all of the latest industrial and safety standards for electronics applications. Overall, APPLIED MATERIALS Endura II provides a high level of performance and precision in a reliable and safe package. It can be used for a range of semiconductor applications, from thin film deposition to surface etching and optical coatings. With its advanced RF and computer control system and robust chamber design, Endura II is a great choice for many PECVD systems.
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