Used AMAT / APPLIED MATERIALS Endura II #9293625 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is an advanced CVD (chemical vapor deposition) Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor. AKT Endura II PECVD reactor has been designed to ensure maximum process uniformity and highest deposition rates, resulting in improved yields when in use. AMAT Endura II PECVD reactor utilizes radio frequency power to generate a plasma in the process chamber, with the plasma activated by a precursor gas that is injected into the chamber. The activated precursor gas can be used to deposit a wide variety of thin films, including oxide, nitride, and polysilicon. This is achieved through the thermal or non-thermal dissociation of the precursor molecules, which are reactively decomposed and deposited as a thin film on the substrate surface. The process chamber of Endura II can be configured to accommodate different product sizes, materials and substrate configurations. APPLIED MATERIALS Endura II PECVD reactors are available in several configurations including batch chamber, horizontal tube, and vertical tube. AMAT / APPLIED MATERIALS / AKT Endura II also features a gas distribution system that ensures uniform gas distribution across the whole chamber, allowing for uniform deposition across the substrates. The chamber is also equipped with an RF coil that provides uniform radio frequency distribution within the chamber. AKT Endura II's advanced heating elements are designed to ensure a rapid start-up and uniform process temperature in the chamber. This helps to ensure that the reaction takes place correctly and that the desired thin films are deposited with high accuracy. AMAT Endura II also offers several advanced control options that can enhance process accuracy and repeatability. These features include end point control, purge diffusion, and program setting edit features that allow for precise process optimization, ensuring repeatable process results. Endura II PECVD reactor is a reliable and easy to use tool that offers superior deposition performance and uniformity. This PECVD reactor is well-suited for use in a variety of challenging production environments including microelectronics, MEMs (microelectromechanical systems), flat-panel display and advanced packaging applications.