Used AMAT / APPLIED MATERIALS Endura II #9296945 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is an advanced process/reactor equipment designed to fabricate ultra-high purity materials for semiconductor applications. AKT Endura II is a low-pressure chemical vapor deposition (LPCVD) reactor, designed to produce a wide range of semiconductor films, including dielectrics, gate oxides, and barrier layers. The system's process chamber is cylindrical in shape and constructed with a stainless steel body. The vacuum tight chamber enables the reactor to achieve an ultimate vacuum range of 10-6 Torr. The unit's nitrogen purge machine prevents the possibility of oxidation and particles from entering the reactor chamber. The precise temperature control enables AMAT Endura II to adhere to process parameters of tight temperature uniformity required for thin film deposition. Endura II can deposit a variety of films with a low thermal budget. This enables the deposition of thin films with a small overall process temperature. By using plasma processes, APPLIED MATERIALS Endura II features superior plasma source performance. The touchscreen-enabled interface provides a more intuitive user experience, allowing operators to accurately monitor process conditions. Additionally, the tool is designed with a flexible manifold asset, which offers precise flow control in order to optimize reaction rates and product quality. AMAT / APPLIED MATERIALS / AKT Endura II features an efficient design, with multiple subsystemsallowing for accurate control and monitoring of process conditions. This ensures the highest level of process repeatability. AKT Endura II also provides a variety of safety features, such as a low temperature interlock, to ensure the safety of operators. This makes the model ideal for semiconductor manufacturing processes. AMAT Endura II is a reliable reactor equipment, wellsuited for advanced materials fabrication applications. Its efficient design and precisely controlled temperature, flow and pressure systems provide ideal conditions for repeatable, high quality process output. The intuitive user interface and safety features make the system an ideal choice for manufacturing higher quality semiconductor products.