Used AMAT / APPLIED MATERIALS Endura II #9298482 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is an advanced chemical vapor deposition (CVD) reactor specifically designed for the most demanding microelectronic processing requirements. As one of the most advanced reactors available, AKT Endura II is capable of producing highly uniform films with excellent temperature, film thickness, and step coverage control over large chamber sizes. AMAT Endura II is ideally suited for highly complex and precision processes such as the thin film deposition of Ti/TiN bilayers, nitride-based metal gate films, and sulfur films for advanced CMOS and semiconductor applications. Key features of Endura II include multi-functional source inserts, precise control of gas and chamber temperature, and advanced process monitoring systems to ensure maximum process uniformity and yield. APPLIED MATERIALS Endura II offers unmatched process flexibility, enabling users to modify process parameters such as gas flow rates, substrate temperatures, and masking points based on the specific application and substrate shape and size. This ensures a uniform film deposition over a variety of substrate types, including aluminum (Al), tungsten (W), or gold (Au). The equipment's state-of-the art robotics handling system also enables the unit to transfer exact amounts of gases to the processing chamber and accurately distribute them reliably for extended lifecycles. Thanks to its advanced and innovative design, AMAT / APPLIED MATERIALS / AKT Endura II provides outstanding repeatability, process stability, and particle control. The machine's gas inlet dispersal tool ensures gas delivery at consistently high performance levels to ensure that the substrate sees exactly the same gas profile each time the process is running. AKT Endura II also features a robust quartz chamber design with tightly sealed housing that offers superior process repeatability and excellent process control. Featuring an advanced thermal management asset, AMAT Endura II enables precise temperature control for both substrates and wafers. Endura II incorporates a vertical cascade heating model which allows for precise and uniform tempering of chambers from top to bottom. This ensures a homogenous temperature and a uniform deposition across every site on the substrate. Additionally, APPLIED MATERIALS Endura II's multi-zone AccuHeat equipment can be used to enable even more precise temperature control. By combining superior performance and advanced process control, AMAT / APPLIED MATERIALS / AKT Endura II is the perfect choice for today's most demanding precision CVD applications in the semiconductor and MEMS industries.