Used AMAT / APPLIED MATERIALS Endura II #9315097 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a single-wafer reactor designed to provide a comprehensive, durable, and user-friendly process tool for semiconductor device fabrication. AKT Endura II utilizes advanced technologies, such as a high-frequency inductively coupled plasma (ICP) source, rapid-pulsing biasing generator, and multiple etching hardware configurations to enable high-quality fabrication with a wide range of device structures. AMAT Endura II's fully-integrated equipment consists of a cryogenic cryostat, in-situ carrying assembly, remote control system, and fixed-frequency high frequency ICP generator. This combination provides a low-cost, high-performance ICP etching unit which can be easily integrated into existing semiconductor fabrication lines. APPLIED MATERIALS Endura II's modular design allows for easy scalability and upgrades in order to meet the needs of a customer's fabrication line. All components of the machine can be configured to an individual customer's needs. The process chamber design is also optimized for etching uniformity under varying process conditions. Endura II's high-frequency ICP source offers recipe flexibility and enables precise control over etch rate, etch selectivity, CD (critical dimension) tolerance, and other film properties. The RF biasing generator also allows for precise control over etch and deposition processes. AMAT / APPLIED MATERIALS / AKT Endura II's in-situ carrying tool enables high throughput and provides wide level process capability, from single-level patterning to multi-step processing. The rapid pulse biasing generator provides fast process time and excellent CD control without compromising etch rate accuracy or process uniformity. AKT Endura II also features an easy-to-use user interface and intuitive alarm management, so that users can quickly setup and monitor process sequences. In addition, a full range of diagnostic tools is provided, which allow customers to monitor and analyze their process and identify any potential process issues. Overall, AMAT Endura II provides customers with a comprehensive, durable, and user-friendly process tool for semiconductor fabrication. Through its high-frequency ICP source, rapid-pulse biasing generator, and other features, APPLIED MATERIALS Endura II enables customers to achieve accurate, repeatable, and cost-effective device fabrication.