Used AMAT / APPLIED MATERIALS Endura II #9315104 for sale

AMAT / APPLIED MATERIALS / AKT Endura II reactor is a state-of-the-art solution in the production of semiconductor devices. This reactor features a two-stage inert gas shower process for developing robust nitride and dielectric films. This process helps in improving device performance and reliability, while also reducing defects. The reactor uses a high-efficiency thermal management equipment that is tuned to the machining environment and allows for precise process control. This technology helps in achieving uniform temperatures over the entire substrate surface, allowing for optimized deposition and etching results. The reactor is equipped with an advanced Computer-Controlled Graphical User Interface (GUI). This allows the operator to easily access the reactor settings and customize the parameters for the optimal results. AKT Endura II reactor has a high-flow rate furnace that utilizes a highly efficient heating system. This ensures rapid and efficient delivery of hot gas to the process while maintaining uniform temperatures across the substrate surface. This design helps to reduce thermal gradients and improve deposition homogeneity over the substrate. Additionally, the efficient gas utilization results in low operating costs over the life of the reactor. AMAT Endura II is equipped with a low-emission plasma source which helps to reduce particle production during plasma enhanced deposition. This optimizes the process for high-quality multi-layer stacks while minimizing the risk of contamination. The reactor also offers an optional Substrate Landing Chamber (SLC) to ensure direct cooling of the substrate after the process is complete. Additionally, the reactor is equipped with multiple in-situ diagnostics. These features help to monitor the reactor performance, decrease process up time, and reduce maintenance costs. Overall, Endura II reactor is a state-of-the-art nitride and dielectric film deposition unit. This machine features advanced thermal management and plasma sources, as well as multiple in-situ diagnostics. This innovative tool helps in improving the process control and efficiency while also reducing defects. APPLIED MATERIALS Endura II reactor offers an excellent capability for developing robust and reliable devices, making it an ideal choice for semiconductor device fabrication.