Used AMAT / APPLIED MATERIALS Endura II #9358610 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a production-ready reactor designed for low-pressure chemical vapor deposition (LPCVD) processes. It is equipped with a high-precision, low inductance filament power supply, automated susceptor height adjustment, low-noise bearing assembly, patented process chamber architecture, and high deposition uniformity. AKT Endura II utilizes a patented chamber architecture with an optimized process shape to maximize gas-flow uniformity and improves thermal uniformity, process repeatability, and process stability. The low inductance power supply is designed to reduce electrical noise, which minimizes potential contamination of the process and results in higher yield and improved quality. The automated susceptor height adjustment allows precise, repeatable wafer positioning, reducing lot-to-lot variation in film thickness. The low-noise bearing assembly helps maintain consistent environments, giving repeatable processes and improved process quality. AMAT Endura II is a highly adaptable system, with features such as a quartz resistive take-off point, HCl control valve, and up to three rotating gas valves. It has a wide operating window of temperatures and pressures and includes standard dual RF power capabilities. The powerful EasyCenturion software provides automated process recipes which can be quickly transferred between systems and makes remote process monitoring and process control possible. The overall performance and reliability of Endura II makes it a great choice for LPCVD processes. It is an ideal tool for production processes requiring high-repeatability and high-uniformity, such as the deposition of silicon nitride or polysilicon. The powerful EasyCenturion software also makes it a great choice for research-based applications, allowing for rapid prototyping of new processes and rapid transfer between different reactors.