Used AMAT / APPLIED MATERIALS Endura II #9358612 for sale

AMAT / APPLIED MATERIALS / AKT Endura II reactor is a tool used in semiconductor fabrication processes. It uses chemical vapor deposition (CVD) via an Ultra-High Vacuum (UHV) chamber to deposit thin films of oxide, nitride, and other materials into substrates. This CVD process allows for precise control over the thickness and composition of the material deposited, making it ideal for creating high-quality electronic components. AKT Endura II reactor has a UHV chamber with a cryo-pumped ion source designed to handle a wide variety of materials. The chamber can be pressure-sealed, and has internal measurement and control systems to ensure reproducible results. A programmable logic controller (PLC) is used to manage and control the process parameters for maximum efficiency. AMAT Endura II is equipped with two gas lines that can supply up to 10 gases, plus an additional two auxiliary gas lines. The gas lines can be equipped with manual, pneumatic, or motor-driven valves. The gas lines allow for precise introduction and blending of gases to the processing chamber. Endura II has an advanced quartz etching system which ensures the substrates are suspended correctly. The substrates can be heated to temperatures up to 1,000°C which allows active process steps to take place in the chamber, including chemical etching, thermal oxidation, ion bombardment, and chemical vapor deposition. A built-in plasma generator is used for enhanced low-temperature operations. APPLIED MATERIALS Endura II is designed with safety and ease of use in mind. The unit is completely enclosed and equipped with a safety interlock to prevent accidental operation. The PLC can be programmed for semi-automatic operation to ensure repeatable and reproducible results. The unit is self-diagnosing and equipped with a suite of automated monitoring systems to ensure maximum safety and accuracy.