Used AMAT / APPLIED MATERIALS Endura II #9358618 for sale

AKT/AMAT / APPLIED MATERIALS / AKT Endura II reactor is a highly reliable, industrial-grade deposition tool used in advanced semiconductor fabrication processes. This reactor is renowned for its robust design, vibration-tolerance, and long service life. AKT Endura II reactor is comprised of several components: a base chamber, a loadlock mechanism, a gas distribution system, an ion source, a target, and a plasma source. The base chamber is constructed of two parts, a central body and a removable cover—all of which is made of aluminum. The cover holds all of the components together and is sealed with four quick-release clamps, while the central body is capable of withstanding atmospheric pressure. The chamber also includes several stainless steel ports for pressure, power, and gas delivery lines. Vacuum pumps located on the outside of the chamber allow for pressure control within the chamber. The loadlock mechanism provides a non-sealing, heated entryway to the chamber. The loadlock has two parts: an input door and an output door. The input door is designed to keep contaminants out, while the output door prevents high pressure from escaping from the chamber. The gas distribution system is made up of two parts: the gasline and the gasmass. The gasline is designed to regulate the flow rate of each gas and measure pressure within the chamber. The gasmass is a series of tubes that direct the gas to its destination within the chamber. The ion source is designed to introduce charged particles into the deposition chamber. This is achieved by the application of an electric field, causing the particles to be ejected from the source and move towards the target. The target is the workpiece that is placed inside of the chamber. This is usually a substrate, such as a silicon wafer. During the deposition process, the target is bombarded with ions and deposited material. The plasma source is responsible for energizing the particles and facilitating the deposition. This source uses high frequency electrical waves to create a plasma which is then directed into the chamber. Overall, AMAT/AMAT Endura II reactor is a powerful, reliable and easy-to-use tool for semiconductor fabrication. The many components of the system have been designed with longevity and efficiency in mind, offering users a cost-effective and reliable deposition process.