Used AMAT / APPLIED MATERIALS Endura II #9363128 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is an advanced physical vapor deposition (PVD) reactor used in semiconductor manufacturing. It offers tight process control to provide increased uniformity, repeatability, and high throughput rates. It is a high-performance machine and consists of three main components—the process chamber, the vacuum equipment, and the process control system. The process chamber is an airtight vacuum container outfitted with tilting and rotating shelves for holding the substrate. During the manufacturing process, the substrate is loaded and unloaded, and the chamber can also be tilted and rotated to tilt the substrate for optimal coatings. The vacuum unit controls the flow of gases in the chamber and is responsible for purging the outgassed materials. This machine is also in charge of keeping the chamber under vacuum during deposition processes. The third main component is the process control tool. This is the mechanism that ensures accuracy and repeatability during coating, by precisely controlling gas flows, temperatures, pressures, and substrate positions. It can detect and monitor various process variables like pressure, carrier gas flow, and deposition rate, which helps in achieving the desired outcome. It is also responsible for controlling the throttle valve, power supply systems, and plasma generators, allowing these components to work optimally. AKT Endura II is a highly advanced-level PVD reactor, suitable for use in the most advanced semiconductor fabrication processes. It effectively combines the process chamber, vacuum asset, and process control model to deliver precise coating process and ensure uniformity, repeatability, and high-throughput rates. It is the go-to product for achieving the highest coating quality and maximum productivity.