Used AMAT / APPLIED MATERIALS Endura II #9379779 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a reactor designed and manufactured by AKT for the semiconductor industry. It is a reactive ion etcher (RIE) machine featuring variable-frequency excitation, 200 mm (7.87 inches) wafer capacity, a sample-stage quartz Q-ring, as well as various types of end-point detection sensors. AKT Endura II machine, a type of chemical etcher designed for the semiconductor industry, is an efficient and cost-effective solution, meeting the demands of the semiconductor industry. With ETCH rates ranging from 0.1 to > 10μm/min, AMAT Endura II is ideal for etching a wide variety of materials, such as Sidewall isolation structures, RIE Oxides, Nitrides and Polysilicon as well as various metals, oxides and nitrides. It consists of a process chamber, a quartz Q-ring, top, PCBA board, bottom, generic gas assembles, an ACBL ion source, and a process-chamber assembly. APPLIED MATERIALS Endura II can provide a wide range of vacuum levels in order to handle various etching processes and etching gasses. A variable frequency mechanical excitation Power supply is also included in the Reactor. The Q-ring on Endura II reactor is designed to rotate the sample on the sample holder at different angles in order to ensure homogeneous etching of the sample and prevent lateral etching. In addition, AMAT / APPLIED MATERIALS / AKT Endura II utilizes a number of mixing gas and process gases to produce other parameters such as pressure, temperature, and RF power to ensure proper RIE etching. Furthermore, AKT Endura II is computer controlled and uses a variety of software programs to manage the etching processes. This allows for precise control of the etching processes in order to reach desired results on various materials. Furthermore, AMAT Endura II features a number of end point detection sensors to accurately measure pressure, power, load and temperature. In conclusion, APPLIED MATERIALS Endura II is an efficient and cost-effective reactive ion etcher with a 200 mm wafer capacity and variety of end-point detection sensors. It is a reliable and precise machine with a wide range of etching applications for the semiconductor industry.