Used AMAT / APPLIED MATERIALS Endura II #9389807 for sale

AMAT / APPLIED MATERIALS / AKT Endura II is a plasma-enhanced chemical vapor deposition (PECVD) reactor used for producing thin-film coatings and deposition on semiconductor and solar photovoltaic devices. This reactor is capable of providing uniform films with excellent pixel fill and high throughput. AKT Endura II is designed to be highly reliable and has a wide process window for various types of processes. The equipment is comprised of three main components: a power module, a gas distribution module, and a process chamber. The power module contains a plasma energy source, a high voltage power supply, and a plasma ignition controller. This system allows for precise control of the plasma temperature and density for repeatable and repeatable results. The gas distribution module distributes the process gases into the chamber and is also responsible for controlling both the pressure and flow of the process gases. The process chamber itself is designed with a robust and reliable design with an easy to use control unit, providing a wide process window for almost any deposition process. The machine is capable of handling deposition equipment up to 41" in size and allows for continuous film deposition rates of up to 500 Ångströms/minute when using either amorphous silicon or silane gas. It also provides an auto-purge tool that cleans the chamber after each deposition. Furthermore, AMAT Endura II includes a robust safety asset to monitor and detect any potential out of range process parameters. This model is an ideal solution for solar cell production and other semiconductor applications requiring precise film deposition that requires a wide processing window. It offers the highest throughput for large-area thin-film deposition while ensuring repeatability and reliability. This is critical for manufacturers ensuring accurate and uniform coatings for their semiconductor or solar photovoltaic devices.