Used AMAT / APPLIED MATERIALS Endura II #9402493 for sale

AMAT / APPLIED MATERIALS Endura II
ID: 9402493
Sputtering system.
AMAT / APPLIED MATERIALS / AKT Endura II is an advanced processing system designed for semiconductor device manufacturing. It is intended for advanced deposition and etch applications, and is composed of four main components: the Reactor (capable of semiconductor processing), the Sensor Module (real-time chamber process monitoring and adjustment), the Process Control Modules (data monitoring and control), and the Purge System (for purifying the gases used in processing). The Reactor consists of a vacuum chamber into which the substrate to be processed is placed. There are inlets that allow the deposition gas, etch gas, and purge gas to enter the chamber and be used in processing. The chamber is heated and held at an optimal temperature range to ensure the desired processing results. The arm that holds the substrate lifts and lowers it as needed in order to optimize and control the reaction, and a plasma is generated when high-frequency energy is applied and RF power is delivered to the reaction chamber. The Sensor Module monitors the plasma, chamber temperature, and other variables during the reaction process in order to make necessary process adjustments. This information is also sent to the Process Control Modules, which analyze the data and a decision is made as to whether additional RF power is required or if a different gas mixture should be used. The Process Control Modules also have subsystems that can control all facets of the reaction process. This includes controlling the substrate temperature, adjusting etch and deposition rates, changing etch and deposition recipes, and accurately controlling the entire process. The Process Control Modules also enable the operator to adjust the pressure inside the chamber, by ensuring the valves and other pressure controls are opened and closed in order to maintain the optimal pressure inside the chamber. The Purge System helps maintain optimal purity levels of the gases used in the deposition and etch process. The multi-stage filtration systems ensure that the gases used in the process remain at the highest quality levels. This helps protect the substrate being processed and ensures that results are consistent and repeatable. AKT Endura II is a powerful, reliable and versatile machine designed for semiconductor fabrication. The various components work together to not only provide optimum results, but also allow for a great deal of control over the entire reactions process. This allows for repeatable, high-quality results in advanced deposition and etch applications.
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