Used AMAT / APPLIED MATERIALS Endura Pre Clean Chamber #9009003 for sale

AMAT / APPLIED MATERIALS Endura Pre Clean Chamber is an automated polysilicon reactor designed to provide high-level wafer cleaning during the chemical vapor deposition (CVD) process of silane deposition. This specialized reactor is used to effectively clean the wafer before the deposition process begins, helping to eliminate contamination and ensure consistent, high-quality deposition results. The pre-clean reactor chamber is cylindrically shaped and designed to accommodate multiple wafers simultaneously, allowing for increased throughput and reduced cycle times. Inside the chamber, multiple gas injectors are strategically placed to help promote an even distribution of silane and reactant gases across the wafer surface. The entire chamber is also evacuated and heated to ensure uniform temperatures throughout the cleaning process. The cleaning process itself is automated and consists of several stages. First, the silane is heated and passed through the injectors into the chamber, creating a uniform coating of reactant particles on the wafer surface. Next, the wafer is heated to a pre-determined temperature which helps to initiate the oxide formation and breakdown. This process helps to effectively and quickly remove any surface contaminants present and prepares the wafer for CVD processing. Once the pre-clean cleaning is complete, the chamber is purged and pressurized with a non-oxidizing gas. This helps to protect the wafer from oxidation and further contamination while it is removed from the chamber and transferred back to the CVD unit. AMAT Endura Pre Clean Chamber is an excellent choice when it comes to wafer cleaning solutions, providing consistent and reliable performance.