Used AMAT / APPLIED MATERIALS Endura PreClean #293623456 for sale

AMAT / APPLIED MATERIALS Endura PreClean reactor is a vapor deposition system used in the semiconductor industry. It is designed to evenly coat substrates with a thin layer of film. The reactor's advanced design ensures that the layers created have a uniform distribution and superior adhesion. AMAT Endura PreClean reactor utilizes a four-chamber sublimation chamber to achieve its target results. The inner high-vacuum chamber is comprised of a quartz tube with a three-channel injector at the bottom. This injector disperses the source materials through the tube, allowing the materials to sublimate into a vapor. By controlling the rate and type of source materials used in the reactor, the materials can be applied to the substrate at a precise thickness. The three-channel injector at the bottom of the quartz tube has three separate openings for the introduction of source materials. Each opening is individually controlled, allowing for the precise deposition of each material. The injector acts as a gate to control the pattern and spacing of each material as melted and applied. APPLIED MATERIALS Endura PreClean reactor has a low-pressure, low-temperature chamber. This second chamber helps ensure a steady and uniform deposition of the material onto the substrate. By maintaining a constant temperature and pressure, the materials are kept in a semi-solid state, which allows them to be evenly distributed and pushed into the substrate. The third chamber of Endura PreClean reactor is a high-temperature, high-pressure chamber. This chamber serves as the aftermath of the deposition process. It allows the materials to cure and become solid, ensuring a strong bond between the material and the substrate. The fourth and final chamber of AMAT / APPLIED MATERIALS Endura PreClean is the furnishing chamber. This chamber provides the necessary tools and equipment to clean and polish the substrate after it's been coated. The disposables in this chamber include abrasives, polishing agents and protective gloves. The state-of-the-art technology of AMAT Endura PreClean reactor makes it an effective choice for coating substrates in the semiconductor industry. With its four-chamber design and its precise control over the rate and pattern of material deposition, the reactor is able to ensure a uniform and effective layer on the substrate.