Used AMAT / APPLIED MATERIALS Endura PVD #151575 for sale

AMAT / APPLIED MATERIALS Endura PVD reactor is a state-of-the-art physical vapor deposition (PVD) equipment designed to deliver high-quality results in a wide variety of deposition applications. AMAT Endura PVD system is a single-batch tool that combines a chamber, RF source, and crucible to provide fast, repeatable, thermally-stable layer deposition. APPLIED MATERIALS Endura PVD unit provides an advantageous suite of features for high-performance layer deposition, including dynamic machine control, plasma power modulation, integrated process control, and pre- and post-process options. Endura PVD chamber is a stainless-steel structure with a multi-piece closed-volume environment and an integrated graphite susceptor plate. The RF source includes an advanced broadband matching network, state-of-the-art frequency-tunable power supplies, and an inductively-coupled inductor to provide a reliable, repeatable, and consistent power delivery. The crucible is designed for uniform thermal distribution and efficient heat transfer, which helps provide superior thermal stability during processes, even at higher temperatures. AMAT / APPLIED MATERIALS Endura PVD tool has a fully user-programmable digital controller, complete process control, and built-in temperature sensors. This asset is designed to precisely set process parameters to achieve the target deposition layer, a nebulizer that atomizes the vapor stream and delivers vaporized reactant materials with high consistency, and a mounted thermal camera for monitoring substrate heating and cooling. AMAT Endura PVD model has multiple precursory processes available, including degassing, purge, cleaning, and warm-up. Additionally, the equipment utilizes post-process options such as cool down, stasis maintenance, and flux-freeze. These features ensure that the critical temperature parameters of the process are achieved throughout the cycle. APPLIED MATERIALS Endura PVD system is designed to accurately and precisely deliver the desired layer deposition characteristics for the achievement of high-performance results in a wide range of application specialties, including semiconductor, display, and disk drive industries for advanced wafer and glass layers. The unit is highly configurable and user-friendly, making it an ideal choice for research and manufacturing applications.