Used AMAT / APPLIED MATERIALS Endura SL #293722942 for sale

ID: 293722942
Wafer Size: 12"
Vintage: 2001
W-CVD System, 12" OHT WIP Delivery (2) Load ports Load port type: (25) Wafer FOUPs Operator access switch E84 Sensors and cables KEYENCE with BCR (4) Colours configurable light tower (2) Heat Exchangers NESLAB Chiller / Steelhead-1 UNISEM UN2002APG Gas scrubber Chamber position 1, 4, C and D: Tungsten Pumps: IPUP Type: ALCATEL A100L Position 1, 4, C, D: EBARA A150 Type 2001 vintage.
AMAT / APPLIED MATERIALS Endura SL Reactor is a high performance, high quality chemical vapor deposition (CVD) equipment. This system is designed for industry-leading atmospheric-pressure, single-wafer CVD processes for semiconductor device manufacturing. AMAT Endura SL Reactor provides exceptional conformal deposition with superior uniformity of films to enable the latest 3D ICs, LEDs and MEMS. The core of APPLIED MATERIALS Endura SL Reactor is its superior gas control. It features an innovative design with lower energy consumption and higher throughput, resulting in greater productivity and efficiency. Endura SL Reactor provides dynamic flow control with excellent short-term uniformity to enable deposition of consistent films. Its CVD chamber is designed to be multi-zone controllable with the ability to optimize multiple process recipes in one chamber. It has innovative load lock unit design that allows for precise low load wafer processing. AMAT / APPLIED MATERIALS Endura SL Reactor also offers full-range temperature control from low-temperature deposition up to 900°C. This temperature flexibility enables a wide range of CVD processes including PECVD, PEALD and ALD. The reactor also offers in-situ and ex-situ diagnostics for fast detection and correction of process control issues. Its software suite provides automated control of the entire CVD process for better control and repeatability. In addition, AMAT Endura SL Reactor boasts exceptional process control stability via a unique, integrated closed-loop control architecture. It can maintain process conditions, such as temperature, humidity, flow rate, and pressure, over long periods without drift. This ensures that the CVD process is always under precise control. APPLIED MATERIALS Endura SL Reactor also offers a wide range of automated safety features. These ensure that processes are operated safely and with minimal risk to personnel, equipment, and the environment. The automated safety protocols monitor parameters such as pressure, flow, temperature, and more, and can shut off processes when pre-established thresholds are exceeded. Overall, Endura SL Reactor is a high-performance CVD machine designed to meet the most stringent requirements for semiconductor device manufacture. With its superior gas control, full-range temperature control, and automated safety features, this tool offers the highest quality deposition and process performance on the market. It is an ideal choice for companies looking for reliable, repeatable CVD processes for their next generation of microelectronic devices.
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