Used AMAT / APPLIED MATERIALS ENDURA #177672 for sale

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ID: 177672
Wafer Size: 6"
Vintage: 1995
Sputtering system, 6" 1. ALCu(Clamp) 2. Wide-Ti(A101) 3. Wide-Ti(A101) 4. STD-AL-Si-Cu(Clamp) 5. - A. Pass B. Cool C. PC2 D. PC2 E. ORIENTER-DEGAS F. ORIENTER-DEGAS BUFFER: HP XFER: HP LL: NARROW MAGNET: DURA & G12 Pumps: EBARA AA40WN, AA40W, AA70W Missing: SBC FDD 24V Power supply Currently installed and shut down 1994 vintage.
AMAT / APPLIED MATERIALS ENDURA Reactor is a high-quality chemical vapor deposition (CVD) equipment designed for material deposition processes in the semiconductor industry. The reactor offers superior performance and excellent engineering support in a cost-effective package. AMAT ENDURA provides precise control of the vacuum processing environment and optimal choice of processes, materials and deposition rates. APPLIED MATERIALS ENDURA utilizes a gas delivery system with a multi-orifice effuser, precise pressure control valves to obtain precise pressure regulation, and a uniform gas distribution plate to obtain uniform gas distribution. It also boasts a multi-orifice effuser, diverter plates, valve-controlled heating sources, and a unique triple-source dispenser unit to obtain uniform deposition results. ENDURA is capable of running both thermal and plasma enhanced CVD processes, and its ability to accommodate a wide range of materials for deposition makes it ideal for a variety of applications. Each process can be tailored to optimize the deposition rate, uniformity, and selectivity. Additionally, the large process window and precise control of process parameters enables the user to accurately apply their specific process design. AMAT / APPLIED MATERIALS ENDURA CVD reactor offers superior thermal stability and thermal uniformity across its large 115mm x 265mm substrate capacity. It also employs advanced flow control to achieve the most uniform flow pattern and uniform deposition for improved yields. The machine's intelligent control capability enables the user to adjust process fluids and temperatures accurately and quickly, and its automated process control minimizes user intervention and saves time. AMAT ENDURA CVD Reactor has been engineered to be easy to use, safe, and reliable in usage. It offers an intuitive 10-inch touchscreen display and an advanced graphic user interface (GUI) that allow the user to quickly validate process settings and quickly adjust parameters as needed. It also comes with advanced safety features such as automatic shutoff in the event of an error, and the tool is equipped with built-in alarm indicators to provide clear and accurate feedback in case of any errors. In conclusion, APPLIED MATERIALS ENDURA CVD Reactor is an ideal solution for any material deposition process task in the semiconductor industry. It offers superior performance, excellent engineering support, and reliable safety features in a cost-effective package. With its precise control of the process environment and automation capabilities, ENDURA provides the user with a highly efficient and cost-effective asset for all of their deposition process needs.
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