Used AMAT / APPLIED MATERIALS ENDURA #200767 for sale
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ID: 200767
PVD system, 8"
Mainframe
System controller
(2) Gen racks
Main AC rack
(3) CTI comp
9600 Nesleb heat exchanger
Transformer
MDX6L Comdel 1001s VHF8000.
AMAT / APPLIED MATERIALS ENDURA is a semiconductor processing equipment designed for ion implantation and thin film deposition. It is used for processing advanced microcircuitry components, such as thin gate oxides, gate electrodes, and embedded re-entry layers in transistors. AMAT ENDURA system consists of two main components: the Implantation and Deposition Cluster (IDC) and the Process Control/Monitoring (PCM) Unit. The Implantation and Deposition Cluster (IDC) is the heart of the unit, responsible for controlling the sequence and timing of process functions. It includes power supplies that provide the necessary energy to drive plasma-based processes and two banks of high-voltage magnetron sources. These sources generate a high-temperature plasma, which is then used to generate energetic ions that can be used for implantation or to sputter a thin film onto the substrate. The high-voltage power supply also enables control of the depth of the implantations and thin film deposition processes. The Process Control/Monitoring (PCM) Unit is the brains of the machine. It is a computer tool that oversees the entire process, from starting up, monitoring, and accurately controlling the parameters of the operation. It receives input from a variety of sensors, including vacuum pumps and ion gauges that monitor pressures, temperatures, and contamination levels for each chamber. The PCM also monitors the high-voltage magnetron sources, and ensures correct operation by monitoring the energy emitted and setting limits accordingly. APPLIED MATERIALS ENDURA asset is designed to be reliable, easy to use, and affordable, making it an attractive choice for many semiconductor companies. It has a robust design that includes a variety of interchangeable chambers to accommodate any specific process requirements, and a highly flexible software platform. This yields a faster and more efficient processing protocol than traditional systems, with fewer errors and more reliable results. The model can process both small and large substrates, and offers complete traceability and process control, making it a reliable choice for modern processing applications.
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