Used AMAT / APPLIED MATERIALS ENDURA #293586745 for sale

AMAT / APPLIED MATERIALS ENDURA is a reactor designed for CVD applications that are used to deposit thin films on semiconductor wafers. AMAT ENDURA platform is built on the same architecture as its predecessor, APPLIED MATERIALS ENDURA PECVD, and provides enhanced variabilities and improved productivity. ENDURA reactor is a versatile CVD system that is capable of depositing thin films of silicon, nitrogen and oxygen-based dielectrics, metals, oxides and polysilicon thin films. It is a self-contained unit that features a high-power generator and a custom inflexible graphite chamber. The generator is capable of delivering active gas molecules to the wafer at various temperatures and pressures. The chamber, meanwhile, is constructed of a highly durable graphite that ensures it can withstand extreme temperatures and pressures, enabling AMAT / APPLIED MATERIALS ENDURA to operate continuously and reliably. AMAT ENDURA is also designed with a two-sided electrode that can coat the wafer from both sides at the same time, reducing the need for moving the wafer between electrodes. This is beneficial for reducing the time required to deposit thin-film layers, as well as decreasing the chance of delamination and other defects. The unit also includes an advanced system for purging, further ensuring the safety and reliability of operations. APPLIED MATERIALS ENDURA is designed for optimum performance and easy maintenance, featuring an intuitive touch-screen interface and an easy-to-use software package. It also offers an array of customizable parameters, making it highly flexible and adaptable to meet the requirements of a wide variety of applications. Additionally, ENDURA is designed to ensure low contamination levels, thus improving product yields and reducing the need for frequent maintenance and repair. Overall, AMAT / APPLIED MATERIALS ENDURA is an effective and reliable reactor for CVD applications. It provides enhanced productivity, flexibility, and precision, thus meeting the needs of a wide range of semiconductor device processing requirements.