Used AMAT / APPLIED MATERIALS ENDURA #9153474 for sale
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AMAT / APPLIED MATERIALS ENDURA Reactor is a state-of-the-art tool for CVD (chemical vapor deposition) and PECVD (plasma-enhanced chemical vapor deposition) that is capable of precise and reliable substrate surface modification. The equipment enables accurate process control and repeatability, resulting in high-quality films and patterning. AMAT ENDURA Reactor is an optimal choice for industrial applications, offering cost-efficient processing, reliability, and precise control. APPLIED MATERIALS ENDURA Reactor is a multi-chamber device that combines an etch chamber and a deposition chamber, enabling rapid and accurate processing. The CVD/PECVD etch chamber is used to etch a substrate surface in a uniform manner and with precise control, creating desirable structural topologies. The second deposition chamber is used to deposit a conformal film onto the etched surface, providing cost-efficient uniformity that is critical for a range of applications. The system is also optimized to provide very precise aspect control, enabling fabrication of nanostructures. ENDURA Reactor features configuration options that provide flexibility for sample processing. The unit also offers different types of fluid delivery manifolds in which a wide range of source gases can be introduced into the chamber. The machine contains advanced wafer control hardware with automated shut-off protocols to minimize potential damage to samples. Additionally, the tool offers temperature monitoring of substrates and easy-to-use pattern recognition software. AMAT / APPLIED MATERIALS ENDURA Reactor is a comprehensive asset that offers optimal process control, reliability, and cost-efficiency. The model finds application in many industrial processes, from creating thin oxide layers used in microelectronics, to synthesizing nanoscale optical waveguides for telecommunications, to fabricating small structures for sensors. AMAT ENDURA Reactor is an ideal partner for your precision engineering and industrial processing needs.
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