Used AMAT / APPLIED MATERIALS ENDURA #9166439 for sale

AMAT / APPLIED MATERIALS ENDURA 5500 PECVD Reactor is a powerful tool for scientists, engineers and technicians working in the semiconductor industry. AMAT ENDURA 5500 reactor provides the highest efficiency and throughput for the plasma-enhanced chemical vapor deposition (PECVD). APPLIED MATERIALS ENDURA 5500 has two parallel reactant gas injection systems placed on either side of the reactor. The reactant gas injectors are designed to optimize gas mixing while providing necessary flows of reactant gas. A maximum working pressure of 6 bars is available, enabling a wide range of deposition processes. Furthermore, ENDURA 5500 reactor operates in a pressure range between 1 and 6 bars and on different wafer sizes (ranging from 50 to 300 mm). By using AMAT / APPLIED MATERIALS ENDURA 5500,scientists and engineering can customize the operational parameters for their deposition process. AMAT ENDURA 5500 reactor offers excellent process control, enabling researchers to precisely define the conditions necessary for their experiment. Temperature and pressure are monitored with an accuracy of 0.1 °K and 0.1 mbars respectively. The reactor has fine-grained temperature control, allowing for tightly controlling substrate temperature and uniformity. Additionally, APPLIED MATERIALS ENDURA 5500 offers superb uniformity and repeatability of the deposition process. This is achieved through the use of a high-performance flux generator which helps maintain uniform flux distribution on the wafer, eliminating variation between wafers and process runs. By providing uniform film thickness and uniform etch profiles, ENDURA 5500 helps increase yield and throughput, effectively shortening the processing time. The Applied Material AMAT / APPLIED MATERIALS ENDURA 5500 also features a robust design and handling capabilities which ensure reliable and reproducible processing of high precision substrates and devices. The reactor features a low-vibration chamber which ensures accurate operation and reduces contamination of the process environment. The reactor also has a built-in automatic cleaning system, further reducing downtime and risk of contamination. Overall, AMAT ENDURA 5500 is a powerful and versatile reactor which offers superior process control and uniformity for semiconductor deposition processes.