Used AMAT / APPLIED MATERIALS ENDURA #9193023 for sale

AMAT / APPLIED MATERIALS ENDURA PVD Reactor is an advanced semiconductor-grade physical vapor deposition (PVD) system designed for production of today's most difficult-to-manufacture devices. It provides uniform film deposition without the need for frequent manual intervention and offers a wide range of process capabilities. AMAT ENDURA PVD Reactor features a plasma-enhanced inductively coupled source and a unique process chamber design that enables superior total thickness control, chamber and target uniformity, and shape control for a variety of materials, including copper and other metal films. APPLIED MATERIALS ENDURA Reactor is a single-unload tool that can process a wide variety of sizes and packages in both batch and cluster configurations. It is designed to be fully automated with hardware and software that allow for easy integration of factory automation tools. This automation capability allows for higher quality and more efficient production yields. ENDURA PVD Reactor provides excellent temperature uniformity, chamber insulation, and target-to-wafer distance for superior particle control and process consistency. Its stock material capability enables improved productivity and increased quality, while its predictive maintenance functions can facilitate proactive maintenance and simplify overall system operation. AMAT / APPLIED MATERIALS ENDURA Reactor also features a modular run chamber design, low-maintenance components, and an intuitive interface. AMAT ENDURA Reactor provides great scalability and flexibility, thanks to its multiple product options, which offer the end user the capability to optimize its specific process. This Reactor also features a wide range of process capabilities, such as: multi-layer deposition, high aspect film ratios, multi-step metallization, and improved isolation without process-induced etching. All of these features are very important in the semiconductor market, where complex devices must be manufactured with extreme precision and accuracy. Overall, APPLIED MATERIALS ENDURA PVD Reactor is a reliable, precise, and cost-efficient tool for the most challenging demanding semiconductor manufacturing environments. It delivers superior performance with outstanding uniform film deposition and excellent shape control, making it an ideal choice for increasing productivity and reducing cycle times. ENDURA PVD Reactor is an invaluable tool for controlling fabrication uniformly in the production of today's most complex and challenging microelectronic devices.