Used AMAT / APPLIED MATERIALS ENDURA #9198486 for sale

AMAT / APPLIED MATERIALS ENDURA is a next-generation plasma-enhanced chemical vapor deposition (PECVD) reactor designed to enable production of high-performance materials used by advanced IC technologies. The reactor provides high-precision substrate processing, including chemical dioxide deposition, and the capability to deposit low-k materials. This enables device manufacturers to produce better semiconductor devices than traditional methods, improving device performance and reliability. AMAT ENDURA is a cost-effective way to produce high-performance semiconductor materials, and is capable of up to 12 wafer runs per hour. The addition of low-k materials to production is important because low-k materials reduce circuit delays and improve electrical performance. APPLIED MATERIALS ENDURA is capable of depositing these low-k materials onto a substrate with a very high degree of control and accuracy, leading to improved electrical performance of the device due to efficient and uniform interconnect spacing. The plasma environment within the reactor is also useful for creating more uniform layers that are free from voids, allowing for more consistent and reliable performance. The high-precision nature of the PECVD process also helps to eliminate electrostatic charging, which can damage delicate device structures. ENDURA utilizes an advanced powder-coat transfer arm to directly transfer signals from the input/output interface (I/O) to the substrate. This increases the accuracy and speed of the PECVD process, and reduces the risk of misunderstanding commands or damaging device structures due to the fast processing of multiple substrates in parallel. Furthermore, the powder-coat transfer arm reduces the amount of ion damage to the substrate. In addition to reducing ion damage, the arm also provides better control of the temperature of the substrate, which can contribute to improved yield and quality of the finished device. In order to maintain a consistently stable process, AMAT / APPLIED MATERIALS ENDURA employs an Advanced Flow Controller. This includes real-time isolation of the substrate from the exhaust stream, which helps to reduce the number of variables in the process, allowing for more consistent and reliable results. The Advanced Flow Controller also allows the user to control the temperature of the PECVD process for more accurate and controlled results. AMAT ENDURA is an advanced PECVD reactor that offers a variety of benefits to the device manufacturer. It allows for the deposition of high-performance materials, as well as low-k materials, with high precision and accuracy, resulting in improved electrical performance. Additionally, the Advanced Flow Controller allows for improved temperature and substrate management, providing a more consistent and reliable production process. APPLIED MATERIALS ENDURA is an invaluable tool for the advanced semiconductor industry, enabling the creation of complex and enhanced devices.