Used AMAT / APPLIED MATERIALS ENDURA #9198490 for sale

AMAT / APPLIED MATERIALS ENDURA is an advanced physical vapor deposition (PVD) equipment used for thin-film deposition. This system is designed for high-precision coating of surfaces with dielectric, conductive or magnetic thin films. With unmatched throughput, extended working distance, and integrated advanced process control tools, AMAT ENDURA provides a reliable, efficient and cost-effective solution for thin-film deposition. APPLIED MATERIALS ENDURA is a powerful and efficient physical vapor deposition unit that offers a variety of features. It offers a high process throughput of up to 20-in/min, a large process area (11x12x50 inches) and a maximum of 200-in/min travel speed. Additionally, ENDURA comes with a unique extended working distance (EWD) feature which allows substrates can be removed without interruption of the process. This also allows for higher deposition rates than other PVD systems. AMAT / APPLIED MATERIALS ENDURA allows for precision thin-film deposition with integrated metrology, process control, and analysis capabilities. It ensures accurate and repeatable thin-film thickness and uniformity with the use of an enhanced optical detection machine. In addition, AMAT ENDURA is equipped with closed loop-process control, in-situ optical reflectance measurements, and a control process platform. This allows for easy recipe setup, precision deposition, and real-time process monitoring. In addition to its precision capabilities, APPLIED MATERIALS ENDURA also offers a variety of safety features for operator and process protection. For example, it has a fully enclosed, dual-point laser safety curtain for operator protection, as well as a safety shield for the substrate handling tool. ENDURA is an ideal solution for a variety of applications including dielectric, conductive, and optical thin-films, photoresist coatings, and nanotechnology. Its reliable performance and efficient throughput make it a great choice for any modern industrial manufacturing facility.