Used AMAT / APPLIED MATERIALS ENDURA #9198491 for sale

AMAT / APPLIED MATERIALS ENDURA reactor is a versatile, cost-effective platform for wafer-level deposition and etch processes. It features an innovative, yet reliable architecture and software-selectable process recipes. AMAT ENDURA reactor is designed to handle a wide range of deposition and etch processes, allowing the user to rapidly select and modify the sequence of physical and chemical operations. The robust design and architecture of APPLIED MATERIALS ENDURA reactor enables sustained, high throughput and yields uniform performance across the substrate. It is designed to deliver superior material flexibility, allowing for etching of both hard and soft materials as well as deposition of complex metal alloys. An extended range of plasma sources, including D.C., I.F., and R.F., permit excellent uniformity for complex processes and hi-k dielectric materials. ENDURA reactor is also designed to support a wide array of source gases including O2, Ar, Xe, and He, as well as many combinations of additional chemistries. The reactor's modular design provides flexibility to configure different etch and deposition chambers, even allowing for different chemistries to be used in one system. The intuitive AMAT / APPLIED MATERIALS ENDURA software suite includes a selection of user friendly features to support process recipes. Users can quickly select and modify the sequence of physical and chemical operations, allowing AMAT ENDURA reactor to easily support different processes without changes to the hardware. This convenient feature allows users to save time and money when switching between processes. In addition to its process capability, APPLIED MATERIALS ENDURA reactor features several elaborate monitoring and on board diagnostics tools to ensure accurate and repeatable results. The reactor's on board sensors provide real-time feedback, allowing for current, pressure, temperature and other parameters to be adjusted for optimal performance. ENDURA reactor is built to maintain the process environment and keep particles at a low level, allowing higher yields. Furthermore, the system is designed to automatically monitor the process environment to detect any changes that could potentially lead to incorrect process results. AMAT / APPLIED MATERIALS ENDURA reactor is a versatile, reliable, and cost-effective platform for wafer-level deposition and etch processes. Its wide operational range, user friendly software, and thorough monitoring system make it a great choice for a wide range of wafer deposition and etch processes.