Used AMAT / APPLIED MATERIALS ENDURA #9198493 for sale

AMAT / APPLIED MATERIALS ENDURA reactor is an advanced semiconductor deposition equipment designed for high-precision thin film deposition. The system is capable of automating multiple thin film processes, including physical vapor deposition (PVD), chemical vapor deposition (CVD), atomic layer deposition (ALD), and plasma enhanced chemical vapor deposition (PECVD). It supports multiple application modules, such as Multi-Zone, High-Density Plasma, and Advanced Showerhead. This enables high precision coating processes with a wide process window. AMAT ENDURA unit is designed to meet the needs of semiconductor manufacturers including advanced process control, high-speed production, and high-precision coatings. The machine is capable of establishing an optimal process window for each material and provide advanced process control as well as high throughput. In addition, its optimized design of the components allows its tool to maximize the capability to meet a variety of process requirements. The asset is composed of multiple components such as the process chamber, vacuum pump, process pumps and control, thermal management, and vacuum kinematics. It features ion showerhead technology for non-contact uniform deposition of thin films onto wafers. It also features a Multi-Zone plasma source for uniform deposition and high throughput. APPLIED MATERIALS ENDURA model utilizes PECVD and CVD technologies for the deposition of silicon-based materials and also enables the deposition of metal and metal oxide materials. It supports a wide range of plasma process parameters, improving the deposition uniformity and allowing for the production of conformal thin films. The equipment also supports a vacuum kinematics delivery system that allows quick, accurate and uninterrupted material delivery upon the substrate. ENDURA unit also has a user-friendly interface that allows the operator to quickly adjust parameters to optimize the deposition process. The machine also includes a variety of software tools allowing users to monitor and control the tool. Additionally, the asset has advanced safety and maintenance capabilities, including automatic chamber cleaning and notification if any process settings reach their limits. AMAT / APPLIED MATERIALS ENDURA reactor is an advanced reactor model specifically designed to meet the needs of advanced semiconductor manufacturing processes. It features a variety of components designed to ensure high-precision thin film deposition and conformal coatings, advanced process parameters, and a user-friendly interface. The equipment helps manufacturers to improve productivity, reduce variation, and enhance their process control.