Used AMAT / APPLIED MATERIALS ENDURA #9198504 for sale

AMAT / APPLIED MATERIALS ENDURA™ Reactor is a tool for semiconductor deposition applications and is designed to provide industry-leading process control, low cost of ownership, and high throughput for enhanced device performance. This reactor is a high-temperature, low-pressure, ring-type equipment that utilizes multiple gas injection points for precise control of temperature and flow. AMAT ENDURA Reactor provides accurate, repeatable, and uniform process control by focusing layer uniformity, particle suppression, and line-edge-roughness (LER). The integrated control system offers robust control layers and precise adjustment of the inert gas delivery; this capability enables uniformity of film thickness, particle suppression and line-edge-roughness to meet demanding wafer requirements. This unit is further supported by its tuned RF source, which helps to ensure a uniform stress distribution across the wafer surface, resulting in better adhesion and deposition uniformity while preserving electrical performance. APPLIED MATERIALS ENDURA Reactor also offers automated process control, with preset recipes and cycle parameters. This allows for repeatable processes with minimal human input to optimize performance. Its integrated status monitor machine allows for an instantaneous review of all process parameters for improved troubleshooting and control. This tool further offers integrated sensors that enable continuous optimization and uniformity control by providing critical feedback to feedback correction loops. ENDURA Reactor includes several advanced safety features, including a safety enclosure to house the reactor, a fast-evacuation asset with adjustable pressure switch and audible alarms, and an inert gas containment safety shield. In addition, the model supports variable frequency RF compatibility for complete control of deposition parameters as well as remote process monitoring. Overall, AMAT / APPLIED MATERIALS ENDURA Reactor is an exceptionally efficient tool for semiconductor deposition applications that has been designed to offer a low cost of ownership, high throughput, and precise control of process parameters for significant improvements in device performance. The intuitive user-interface allows for seamless operation and an array of safety features are further included to ensure efficient operation while keeping safety as a top priority.