Used AMAT / APPLIED MATERIALS ENDURA #9198505 for sale

AMAT / APPLIED MATERIALS ENDURA CVD Reactor is an advanced ex-situ chemical vapor deposition (CVD) equipment that is used primarily to create large scale, high-performance semiconductor devices. AMAT ENDURA reactor is capable of depositing various materials including but not limited to; single or multi-crystalline silicon (Si), germanium (Ge), carbon nanotubes (CNTs) and other conductive nanometallic alloys. APPLIED MATERIALS ENDURA reactor represents a major advancement in both cost and capability compared to older platform technologies. ENDURA CVD system is composed of a three chamber vertical hot wall design. The first chamber is the load lock which allows for a faster and safer substrate exchange. The intermediate chamber is the processing chamber where the material is deposited and the deposition rate is controlled. The final chamber is the purging chamber which purges the unit of any leftover materials. AMAT / APPLIED MATERIALS ENDURA CVD reactor is highly efficient and has a low cost of ownership. AMAT ENDURA reactor is capable of depositing directly onto very large substrates, up to 200mm wafers and it has a high speed deposition capability as well. This allows high rates of throughput and yields over larger batches of substrates. Furthermore, APPLIED MATERIALS ENDURA reactor is designed with advanced tools and resources that allow for greater control over the machine's behavior and result in better process repeatability and uptime. ENDURA CVD reactor offers direct wafer temperature control, which is an added advantage for controlling the uniformity of thin film deposition. It also has multi-zone cyclic process capabilities with an on-board substrate heating tool and gas mixing module, which allows for better uniformity control across the entire substrate. AMAT / APPLIED MATERIALS ENDURA CVD asset is also equipped with the Auto-Gap feature which automatically sets the substrate-to-showerhead distance for consistent deposition rates and uniformity. AMAT ENDURA CVD model can be used for a range of applications in all sorts of industries, such as the production of thin-film optical materials, thin film metallization layers and the creation of semiconductor devices. These functions will benefit a wide range of industries such as renewable energy, semiconductor, electronic and aerospace industries. In summary, APPLIED MATERIALS ENDURA CVD Reactor is a revolutionary ex-situ chemical vapor deposition equipment designed to offer excellent deposition rates, uniformity and low cost of ownership. ENDURA offers its users with advanced tools such as a direct wafer temperature control, multi-zone cyclic process capabilities, and auto-gap feature which makes this an ideal platform for developing large scale and high-performance semiconductor devices.