Used AMAT / APPLIED MATERIALS ENDURA #9198507 for sale

AMAT / APPLIED MATERIALS ENDURA is a full-field wafer processing reactor that has been developed to provide ultra-precise wafer fabrication for cutting-edge semiconductor devices. The equipment has been designed to deliver excellent performance and enable factory integration. AMAT ENDURA reactor features an advanced process control system that provides precise control over the deposition process to ensure high-quality performance. The control unit features advanced features such as automatic process adjustments and patterning control. This ensures that the output from the machine is highly reliable and consistent. APPLIED MATERIALS ENDURA features a broad operating temperature range for wafer processing, allowing for the formation of advanced structures with a supersaturated vapor environment. The vapor environment is generated via a vapor generator that is fed with an argon source. The vapor generator allows for precise control over the formation of the structure on the wafer surface. ENDURA also features an advanced electrochemical oxidation tool that provides excellent oxidation rates. The asset uses an electrochemical oxidation process that is extremely efficient, providing a uniform thin-film deposition at a rate of approximately 5 micron per hour. The thin-film deposition rate is much faster than traditional methods, allowing for the formation of nanoscale structures. AMAT / APPLIED MATERIALS ENDURA also offers a wide variety of process chambers that can be used to process a range of semiconductor materials. This makes it possible to create advanced structures from materials such as Gallium Nitride and Silicon Carbide. The chambers can be configured to customize the processing environment for specific wafers and materials. To ensure a clean and efficient processing environment, AMAT ENDURA reactor utilizes an inert inert gas delivery model that minimizes thermal and nonthermal contamination. The inert gas equipment also increases the speed of the deposition process, making it possible to achieve faster processing times and better quality results. APPLIED MATERIALS ENDURA reactor has been designed to be highly reliable and low maintenance. The components of the system are highly robust and designed to provide consistent performance over time. The unit comes with a comprehensive documentation package which outlines the maintenance and repair protocols that are required to maintain and optimize performance. ENDURA reactor is an excellent choice for semiconductor and nanotechnology wafer processing applications. The advanced process control and automated machine make it possible to quickly turn around high-quality wafer fabrication. The tool also ensures a clean and efficient processing environment with superior control over the formation of nanoscale structures.