Used AMAT / APPLIED MATERIALS ENDURA #9198512 for sale

AMAT / APPLIED MATERIALS ENDURA is a high-performance, large-scale, single-wafer plasma etch reactor designed for complex fabrication processes. The equipment provides superior process capabilities in terms of throughput, complexity, uniformity and reliability, enabling advanced thin-film deposition, etch, and sputtering applications. AMAT ENDURA system is designed to provide the highest level of process throughput and control, while offering the maximum configurability and uniformity. It utilizes an advanced gas distribution unit, an automated plasma generator, and a chamber geometry that enables precision process control. APPLIED MATERIALS ENDURA machine features a configurable, multi-zone showerhead/gas distributor assembly that provides precise control of reaction gases, and allows for a wide range of process parameters to be set. The showerhead assembly utilizes a static or dynamic containment design which directs the plasma reaction gases evenly onto the chamber walls and substrate surface, resulting in highly uniform film deposition, etch, and sputtering. Its unique configuration allows for extremely accurate and repeatable results, as well as enhanced process flexibility. In addition, ENDURA tool utilizes an ion-getter/baffle assembly for enhanced plasma homogeneity and uniformity, and a cycle-time optimization package that enables faster throughput. The asset also includes an automatic process-control program which enables application engineers to closely monitor and adjust the plasma process parameters in real-time. AMAT / APPLIED MATERIALS ENDURA model uses a variety of different process gases, including oxygen, chlorine, argon, and fluorine, enabling a wide range of plasma-based processing applications, including PECVD, RIE, and sputtering. With its advanced features and robust design, AMAT ENDURA equipment is capable of producing high-quality thin films, etches, and sputtered metal films even at the most-advanced levels of process complexity. Overall, APPLIED MATERIALS ENDURA is a high-performance, feature-rich, single-wafer plasma etch reactor that is capable of producing high-quality thin films, etches, and sputter-metal films, even at the most advanced levels of process complexity. The system provides superior process capabilities in terms of throughput, complexity, uniformity and reliability for all thin-film deposition, etch, and sputter applications.