Used AMAT / APPLIED MATERIALS ENDURA #9198517 for sale

AMAT AMAT / APPLIED MATERIALS ENDURA is an advanced etch reactor designed for semiconductor fabrication and other related processes. AMAT ENDURA reactor is specifically designed to perform critical anisotropic (skewed in one direction) etching of wafers. This process is crucial in producing integrated circuits and other components used in semiconductor product manufacturing. APPLIED MATERIALS ENDURA reactor is unique in its ability to process a range of wafer sizes. This includes 200mm (8") and 300mm (12") diameter wafers. The reactor has a variety of features that allow operators to precisely adjust etch rates and conditions. This includes the capability to adjust gas flows and gas composition and temperature, as well as controlling process pressure, power, and bias. This cutting-edge reactor utilizes vacuum sources, cryogenic pumps, and high-pressure gas supplies to maintain the desired etch environment. For this reason, the reactor is designed for the highest level of integration, allowing operators to perform multiple etch processes on the same equipment. This provides an easy to use and effective way of optimizing etching conditions in multiple process steps and various etch chemistries. ENDURA reactors are also equipped with advanced control systems that allow the operators to precisely adjust the process parameters. This includes feedback systems to ensure optimal chamber and gas conditions, along with data logging that can be used for process traceability and analysis. Finally, the reactor is designed for fast loading and unloading with robotic tools, to maximize uptime and throughput. APPLIED MATERIALS/AMD AMAT / APPLIED MATERIALS ENDURA reactors are designed for a wide range of etch applications in the semiconductor industry. It provides a reliable, efficient, and programmable way for operators to perform etching operations. It is ideal for use in high-volume, complex etch processes and enables the use of integrated, automation-compatible tools. This ensures fast process turns, and the optimized settings enable the most efficient, low-cost etching operations.