Used AMAT / APPLIED MATERIALS ENDURA #9198523 for sale

AMAT / APPLIED MATERIALS ENDURA
ID: 9198523
Spool seperator Part number: 0040-54332.
AMAT / APPLIED MATERIALS ENDURA Reactor is a revolutionary piece of equipment that is designed for the production of semiconductor devices, such as transistors, diodes and other circuit elements. This equipment provides a total in-situ, low-temperature sputter deposition of both dielectric layers and metal interconnects, as well as metal contacts needed in the production of these devices. This makes AMAT ENDURA an essential tool for the semiconductor industry. The system itself is comprised of a load-lock chamber, process chamber and two sputter sources, which are used to achieve in-situ sputter deposition. The integrated load-lock chamber is designed to quickly and safely move wafers into and out of the process chamber. The process chamber is then used to control the pressure, temperature, oxygen and other gases during the deposition process. It also contains the two sputter sources for depositing metal interconnect and metal contacts required for the production of semiconductor devices. APPLIED MATERIALS ENDURA is capable of processing submicron-thick dielectric and metal layers using either standard or oxygen based recipes. The unit is also capable of creating multiple layers of various thicknesses very quickly. It also has the ability to deposit via chemical vapor deposition (CVD) and to employ rapid thermal processing, which are both important for creating advanced semiconductor devices. ENDURA also contains a magnetron, which is used for feature control, layer thickness uniformity and step coverage. This magnetron can be placed directly in the center of the process chamber for enhanced uniformity control. The integrated autoloader and vision machine help speed up production time, while the advanced temperature control and plasma power supply provide superior control over the process. Overall, AMAT / APPLIED MATERIALS ENDURA Reactor is an excellent tool for producing semiconductor devices with unprecedented layer thickness control and uniformity. Its integrated components allow for fast and efficient production and with its advanced features, it can take the semiconductor industry to the next level.
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