Used AMAT / APPLIED MATERIALS ENDURA #9198529 for sale

AMAT / APPLIED MATERIALS ENDURA
ID: 9198529
Degas wafer lift Part number: 0242-21351.
AMAT / APPLIED MATERIALS ENDURA (AMAT ENDURA) PVD equipment is a physical vapor deposition (PVD) equipment designed to deposit thin films of metal or alloy materials onto the substrate surface of electronic, medical, and glass components. This system has been designed to serve a wide range of market needs, including high-volume production and multi-user operations. APPLIED MATERIALS ENDURA reactor is based on an optimized dual dynamic web design that provides a large deposition area with higher throughput and lower cost per feature. It also includes space-saving features that help reduce the footprint of a deposition installation. The unit comes with a wide range of vacuum machine configurations and chamber configurations that enable a wide variety of applications. The tool features a robust electrostatic clamping asset that ensures substrate flatness, as well as a dynamic self-aligning robot (DAR) that ensures precise positioning of the substrate and a high yield of well-formed layers. Furthermore, the model has been designed with advanced process control capability, variability, modularity, and scalability for various applications and process sequences. The equipment also supports advanced technologies such as Atomic Layer Deposition (ALD), Hot Ion Implantation (HII), and Plasma Enhanced Chemical Vapor Deposition (PECVD). There are also options to add additional magnets for laser processing and optical materials processing. ENDURA has been designed for various materials and chemicals, including for etching processes, photolithography, electroplating, and more. It is also designed to handle a wide range of substrates, including copper, stainless steel, titanium, and more. AMAT / APPLIED MATERIALS ENDURA system provides high-performance, flexible metrology and inspection capabilities. This includes in-situ metrology to ensure the exact specifications while concurrently collecting detailed process data. For example, a Data Parcel Approach supports concurrent metrology, data collection, and process control, and also supports predictive feedback control. Furthermore, the unit includes an automated wafer-ingestion machine that eliminates manual setup and provides an efficient route to reduced downtime. In addition, the tool includes a number of advanced automation features that increase throughput and yield. In conclusion, AMAT ENDURA is a superior PVD asset designed to address a range of market needs. It's designed for different materials, substrates, and processes, with robust and advanced process control and inspection capabilities. The model also offers space-saving and automation features for maximum throughput, yield, and cost-effectiveness.
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