Used AMAT / APPLIED MATERIALS ENDURA #9198546 for sale

AMAT / APPLIED MATERIALS ENDURA is a chemical vapor deposition (CVD) reactor. It is capable of producing high quality, low temperature films of a variety of materials, such as silicon dioxide, silicon nitride, and tungsten. It can deposit materials over a wide range of temperatures, making it suitable for a variety of applications in the semiconductor, LED, and renewable energy industries. AMAT ENDURA reactor has a cylindrical shape and is built around a central arrangement of components. It consists of a process chamber, which can be switched between horizontal and vertical positions, a mechanical lift assembly which allow for accurate positioning of the susceptor, an RF generator and matching network, a process gas distribution equipment, and a process control system. The process chamber of APPLIED MATERIALS ENDURA CVD reactor is used to manipulate the environment for deposition of materials. It uses a controlled atmosphere of process gas, heat, and pressure in order to synthesize desired films. The chamber walls are made of a dry-pressed, sintered silicon carbide, which has a high temperature capability and is resistant to erosion. The corners of the chamber are fitted with removable quartz lined windows to allow for in-situ optical analysis. An RF generator and matching network are used to provide power supply to the reaction chamber, which can be adjusted to the desired frequency. The mechanical lift assembly provides precise vertical movement of the susceptor, which is the base upon which the material is deposited. It uses pneumatically operated actuators, which can raise and lower the susceptor to the desired position. The susceptor itself is made of graphite, and is heated to the desired temperature. It is also used to release electrical charge. The process gas distribution unit ensures the flow of process gas at the proper rate and pressure to the process chamber. It consists of an injector, valves and a manifold. The injector supplies the specified process gas, and the valves regulate their respective flow rates. The process gas manifold is composed of a series of plates and tubes which direct the flow of gas from the injector to the process chamber. The process control machine of ENDURA CVD reactor allows users to adjust the different parameters related to the operation of the reaction, such as process gas flow rate, temperature, pressure, and applied voltage. It also allows users to monitor the temperature and pressure in the process chamber as well as the electrical power delivered to the tool. AMAT / APPLIED MATERIALS ENDURA CVD reactor is an efficient and reliable tool that can be used to create a variety of carbon-based films with precise control over the deposition process. It is designed with a focus on safety and efficient processing, making it the perfect choice for any sensitive application.