Used AMAT / APPLIED MATERIALS ENDURA #9202897 for sale

AMAT / APPLIED MATERIALS ENDURA equipment is a revolutionary chemical vapor deposition (CVD) reactor designed to enable the deposition of ultra-thin layers of materials to create "smart" coatings, transparent metal surfaces, and other functional materials. This innovative deposition system is specifically designed for use in chemical vapor deposition applications and provides superior precursor transport and uniform, repeatable film deposition for a range of industrial, research and development, pharmaceutical, and biotechnology applications. AMAT ENDURA unit has a wide range of features that make it a reliable and versatile tool for chemical vapor deposition. This CVD reactor is designed with a robust automated gas control machine, providing precise flow and pressure control of reactant and carrier gases. This ensures consistent and high-quality results while optimizing conversion rates, throughput, and uniformity of thin-film deposition. APPLIED MATERIALS ENDURA utilizes a uniquely designed gas injector, which results in minimal dilution of the reactant and carrier gases for detailed control of both reactant concentration and flow rate. ENDURA also includes a range of options for precisely controlling the temperature of the process chamber. These temperature control options enable the exact control of substrate, reactant, and carrier temperatures for rapid, thin-film deposition. In addition, AMAT / APPLIED MATERIALS ENDURA is designed with low pressure and temperature drift for increased process stability and uniformity of results. This temperature control allows for consistent and uniform layer thicknesses, resulting in homogeneous and reliable film characteristics. AMAT ENDURA tool has a single chamber design that maximizes substrate throughput, while also enabling complete reactant and substrate isolation. APPLIED MATERIALS ENDURA reactor also features a small footprint that enables it to be easily incorporated into laboratory and production line environments. Additionally, ENDURA features a programmable process controller with fully-automated control functions, providing repeatable and accurately controlled process results. Ultimately, AMAT / APPLIED MATERIALS ENDURA asset provides an efficient, reliable, and versatile CVD platform for producing thin-film products. This advanced reactor model is designed for both research and development and industrial applications, allowing for user-defined custom fabrication processes. AMAT ENDURA reactor is also versatile and cost-effective, enabling thin-film deposition processes to easily meet exact application requirements.