Used AMAT / APPLIED MATERIALS ENDURA #9223707 for sale

AMAT / APPLIED MATERIALS ENDURA is an advanced, high-throughput, chemical vapor deposition (CVD) reactor component equipment designed to optimize production of semiconductor devices. AMAT ENDURA offers versatility and flexibility to meet evolving device requirements with improved process control and performance. APPLIED MATERIALS ENDURA is based on a revolutionary CVD design, making it a highly reliable system, providing precise process control, improved producibility and exceptional rate performance. The unit utilizes a vertically configurable and modular design, with a shorter process chamber, allowing for higher film deposition rates and a smaller footprint than traditional systems. This machine is also built with closed loop control for precise process set points, is available with a gas delivery tool for precise gas flow delivery, and includes multiple chambers for multi-step process formations. ENDURA is composed of a mainframe, process source, source chamber, substrate stage, process chamber and exhaust ventral, each with individual features to enhance process performance and efficiency. The mainframe is highly automated and allows for easy configuration of multiple pieces of equipment. The process source chamber allows for precise gas delivery, with advanced gas flow control, while the substrate stage provides precise sample placement, with an independent substrate temperature control, to allow for repeatable conditions throughout production. The process chamber is the center of the asset, providing the conditions for the CVD reaction. AMAT / APPLIED MATERIALS ENDURA is equipped with a powerful plasma source and provides uniform temperature control, ensuring reliable film quality over the entire chamber and substrate, even at high deposition rates. The chamber also comes with an advanced HRU (heat recovery unit), providing heat generated from the source to the substrate stage and process chamber to reduce power usage, and further optimize process throughput rates. Lastly, the exhaust ventral helps manage the reactive gas and fumes generated during CVD processing. AMAT ENDURA offers superior process control and is designed to increase production yields, minimize downtime and maximize profitability. Its modular design and efficient operation makes it an expert tool to help lower production costs while improving performance and reliability. The model's high-throughput and controlled CVD environment make it an ideal solution for producing semiconductor devices quickly and cost effectively.