Used AMAT / APPLIED MATERIALS ENDURA #9227874 for sale

AMAT / APPLIED MATERIALS ENDURA
ID: 9227874
Wafer Size: 8"
System, 8" Includes: (4) Chambers Wide body: Narrow body VHP Robot: HP Robot.
AMAT / APPLIED MATERIALS ENDURA Reactor is an advanced, high-performance deposition equipment that offers high throughput and tight uniformity control for a wide range of materials, making it an ideal platform for nearly any deposition application. Developed with proprietary Plasma Enhanced Chemical Vapor Deposition (PECVD) technology, AMAT ENDURA platform is capable of depositing a range of substrates, including metals, dielectrics, conductors, and semiconductors. APPLIED MATERIALS ENDURA's design enables deposition, industrialization, and customization processes. ENDURA features three uniquely designed process chambers, enabling the simultaneous processing of three separate substrates. This is accompanied by four MFP-3D robots and two separately controllable ceramic-to-metal seals, enabling efficient automation of the system's capabilities. Additionally, AMAT / APPLIED MATERIALS ENDURA has a full suite of process control capabilities, such as high-accuracy temperature, pressure, and flow control, as well as a wide array of substrate configurations and RF options. AMAT ENDURA's pure-epitaxial deposition processes are robust and highly durable, enabling the deposition of intricate silicided structures with very high step coverage. The unit features excellent film uniformity, capable of deposition uniformity up to ± 0.5% within all three process chambers. This makes APPLIED MATERIALS ENDURA exceptionally reliable and lends itself towards successful fabrication of a variety of high-performance semiconductor device structures. Other features of ENDURA are its wide process range and exceptional repeatability. AMAT / APPLIED MATERIALS ENDURA's process range is the widest in the industry, enabling to deposition and characterization of a wide range of materials with a single machine. The process repeatability, meanwhile, is impeccably precise, with repeatability as high as ± 0.5%. This ensures accuracy and consistency for repeatable deposition runs for periods of time. A unique feature of AMAT ENDURA reactor is its ability to support industrial-scale production, featuring customization and automation opportunities. This can be seen in APPLIED MATERIALS ENDURA's ability to effectively process high-volume substrates with advanced wafer tracking capabilities coupled with its automated substrate loading and unloading options. Additionally, ENDURA can be integrated with other systems, such as in-line metrology, for even further customization of the tool. In conclusion, AMAT / APPLIED MATERIALS ENDURA is an advanced, high-performance deposition asset that offers impressive capabilities and precision. With a wide process range, automated operation, and flexible customization opportunities, AMAT ENDURA is an invaluable asset for any semiconductor fabrication facility or research and development lab looking to digitalize their processes with advanced deposition solutions.
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