Used AMAT / APPLIED MATERIALS ENDURA #9235921 for sale
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ID: 9235921
Wafer Size: 8"
Vintage: 2006
PVD System, 8"
Product wafer
Wafer shape: SNNF
Controller & system AC
Single Bd computer in controller: V452
EMO Function: Turn to release
Emergency off label
EMO Button guard rings
Shunt trip option
Smoke detector
Facility water flow interlock
Robot & monolith:
Buffer robot: HP
Transfer robot: VHP
Transfer robot blade: Original metal
Buffer robot blade: Original metal
Monolith bakeout heater DBI intk
UHV Pump:
Cryo pump: ONBOARD 8F
System monitor:
Monitor 1: Stand alone
Monitor 1: Cable length, 50'
No monitor select switch
Loadlock and cassette:
Loadlock type: Narrow body
Type: Index / Handler
Loadlock vents: Variable speed soft vent
LL Open / Close switch
Generator rack:
2nd Generator rack installed
2nd Generator rack smoke detector
2nd Generator rack water leak detector
Cable length, 1st to 2nd generator rack, 6'
2nd Generator rack water flow intk
Support equipment:
Neslabs
Neslab water resistivity indicator: Resistivity meter
Neslab drain port valve
No BOC heat exchanger on system
Cryo compressors: Water cooled
(2) Cryo compressors
Cryo lines: 3/4" x 50'
Cryopump controller type: 3 Phase controller
Cryopump water fittings
Signal cable length:
Mainframe to system controller, 50'
Mainframe to generator rack, 50'
Mainframe to cryo compressor, 50'
Main AC to system controller / System AC, 50'
System controller / System AC to prim gen rack, 50'
Main AC to prim gen rack, 50'
Main AC to pump frame, 50'
Main AC to neslab heat exchanger, 50'
Miscellaneous:
Water fittings: SST
Ar / N2 Vent manifold
Air fittings, 3/8"
Swagelok water & air fittings
System roughing pumps
EBARA Pump IF smart
Communications interface: GEM / SECE II
Cooldown chamber rough pump options:
EBARA Pump IF smart
System electrical:
Top control AC power feed
Circuit breaker: 343.8 A
Line frequency: 60 Hz
Small main AC power inlet hole
Line voltage: 208 V
2006 vintage.
AMAT / APPLIED MATERIALS ENDURA is a high-precision reactor used for manufacturing semiconductor parts. It is designed for superior process uniformity and exceptional facility throughput, enabling production of the finest quality components for a variety of applications. AMAT ENDURA is a three-chamber PECVD (plasma-enhanced chemical vapor deposition) equipment capable of producing high-quality, uniform layers of dielectrics, polymers, and other thin films. By using highly advanced and versatile concentrations of reactants, APPLIED MATERIALS ENDURA is able to provide superior deposition performance over a wide range of process parameters. This system allows a wide range of reactors to be established and maintained, enabling production of sophisticated semiconductor devices with superior uniformity across a wide range of product lines. ENDURA also offers several advanced features such as a digital edge server unit and a custom substrate rotation feature. These features give the user greater flexibility in managing process parameters, enabling faster production rates and improved reliability. AMAT / APPLIED MATERIALS ENDURA also includes an intuitive graphic user interface that makes it easy to control and configure the machine. AMAT ENDURA is a highly efficient reactor that can maintain extremely precise temperature and pressure profiles. This ensures that materials are maintained at the optimal level to maximize uniformity of the film layers. APPLIED MATERIALS ENDURA also provides an optimal electrical grounding tool, ensuring a better electrical connection to the part and superior manufacturing results. To ensure superior uniformity of the material layer, the software for ENDURA is designed for precise control over substrate movement and other critical parameters, of deposition process. The configuration of the asset also allows the user to bypass certain processes in order to optimize production, and the intuitive user interface allows for fast and simple navigation of the model. AMAT / APPLIED MATERIALS ENDURA is a powerful, advanced, and precise PECVD equipment. It produces uniformly high-quality products with superior facility throughput, making it an ideal tool for semiconductor manufacturing. The system includes a wide range of features and capabilities that make it a great choice for creating electro-optical devices, switches, receivers, and other semiconductor components that require superior uniformity and accuracy.
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