Used AMAT / APPLIED MATERIALS ENDURA #9258297 for sale

AMAT / APPLIED MATERIALS ENDURA Reactor is a multi-moded process platform specifically designed to be used in the fabrication of advanced semiconductor devices. This reactor provides wafer-level accuracy with both vapor and liquid process steps, combined with industry-leading repeatability with consistent results. AMAT ENDURA Reactor has the ability to precisely heat and cool both wafers and substrates, and offers a wide range of temperature, pressure and flow ranges to allow the most complex processes. The state-of-the-art design provides dynamic thermal management that is suitable for both thermal processes and wet processes. APPLIED MATERIALS ENDURA Reactor is equipped with optimized wall confinements, which provide a short confinement time and a highly efficient thermal cycle. This feature provides for scalability of the processes so that all wafers can be processed with the same results. The dynamic thermal management creates a rapid thermal cycling that helps to ensure consistent performance. ENDURA's heating element is precision controlled and its coating uniformity is verified with the use of Laser-interference-reflectometry (LIR) to ensure consistent results. AMAT / APPLIED MATERIALS ENDURA Reactor offers users the ability to process up to four wafers at once. This allows for multiple wafer processing in one cycle, which increases throughput and efficiency. AMAT ENDURA's gas diffusion manifold (GDM) ensures homogenous process Uniformity across all wafers. The GDM was produced using a sophisticated laser scanning equipment to ensure accuracy and process uniformity. In addition, each module of the manifold is capable of providing up to four individual flow control environments, which allows the reactor to be customized to different process requirements. APPLIED MATERIALS ENDURA Reactor provides temperature control and process flexibility. The reactor offers two types of temperature control- a static system, which enables long-term accuracy and a dynamic unit, which allows for fast temperature tracking. Both systems allow for easy and quick loading and unloading of wafers in a rapid and consistent manner. The integrated data acquisition machine (DIAS) provides real-time monitoring of ENDURA Reactor's performance and process stability. The reactor is also equipped with a thorough exhaust tool to ensure that all process fumes are exhausted safely. AMAT / APPLIED MATERIALS ENDURA Reactor is a reliable, flexible, and versatile reactor that meets the demands of advanced semiconductor device production. This asset provides flexible and reliable process control and accurate thermal management, which ensure that all wafers are processed with consistent results. AMAT ENDURA Reactor allows for multiple wafer processing in one cycle and its integrated data acquisition model ensures that all processes are safe and reliable.