Used AMAT / APPLIED MATERIALS ENDURA #9266216 for sale

AMAT / APPLIED MATERIALS ENDURA
ID: 9266216
Wafer Size: 8"
Vintage: 2000
System, 8" (4) Chambers (2) Chambers: Ti / TiN (2) Chambers: Hot-AL (2) Chambers: Orientor-degas Missing parts: Chambers (3) magnet Massflow 2000 vintage.
AMAT / APPLIED MATERIALS ENDURA Reactor is a well-established physical vapor deposition (PVD) tool used widely in the semiconductor industry. It is designed to provide advanced, high-performance deposition over a wide range of process conditions. AMAT ENDURA Reactor utilizes a single- or dual-chamber vacuum system with reactive gases and precursors in order to deposit the desired material. It features a number of unique capabilities that allow for great control over the exact quality of the material deposition, such as automatic pressure control, high-resolution pressure control, pulsed reactant flow for improved surface roughness, and advanced reaction control for optimizing layer kinetics. Additionally, several plasma source technologies can be integrated, like microwave, e-beam, and direct current (DC) power, allowing for lower-temperature processes and greater control. APPLIED MATERIALS ENDURA Reactor is capable of high-throughput material growth, providing uniform or tailored layer-by-layer growth over large areas. It features a large flexible working area, with the ability to process substrates from several inches to tens of inches in size. To ensure reliability, ENDURA Reactor includes an active contamination removal system and automatic shut-off sequence in the event of any process disruptions. For added convenience, an automated robot door can be included for easy loading and unloading of substrates. Its intuitive graphical user interface (GUI) allows for a simple and consistent process-recipe-driven operation, as well as parallel multiple runs for speeding up processing times. Additionally, its modular design helps facilitate upgrades, ensuring AMAT / APPLIED MATERIALS ENDURA Reactor remains up-to-date as technology and applications change. AMAT ENDURA Reactor provides advanced, high-performance deposition capabilities with great control over material growth quality and throughput. It features versatile processes, reliable operation, and a modular design for easy upgrades, making it an ideal choice for semiconductor applications.
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